中国物理B ›› 2013, Vol. 22 ›› Issue (2): 23701-023701.doi: 10.1088/1674-1056/22/2/023701

• ATOMIC AND MOLECULAR PHYSICS • 上一篇    下一篇

Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

张万经, 马艳, 李同保, 张萍萍, 邓晓, 陈晟, 肖盛炜   

  1. Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai 200092, China
  • 收稿日期:2012-07-19 修回日期:2012-11-01 出版日期:2013-01-01 发布日期:2013-01-01
  • 基金资助:
    Project supported by the Shanghai Nanoscience Foundation, China (Grant Nos. 0852nm07000 and 0952nm07000); the National Natural Science Foundation of China (Grant Nos. 10804084 and 91123022); the National Key Technology R & D Program, China (Grant No. 2006BAF06B08); and the Specialized Research Fund for the Doctoral Program of Ministry of High Education of China (Grant No. 200802471008).

Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

Zhang Wan-Jing (张万经), Ma Yan (马艳), Li Tong-Bao (李同保), Zhang Ping-Ping (张萍萍), Deng Xiao (邓晓), Chen Sheng (陈晟), Xiao Sheng-Wei (肖盛炜 )   

  1. Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai 200092, China
  • Received:2012-07-19 Revised:2012-11-01 Online:2013-01-01 Published:2013-01-01
  • Contact: Ma Yan E-mail:mayan@tongji.edu.cn
  • Supported by:
    Project supported by the Shanghai Nanoscience Foundation, China (Grant Nos. 0852nm07000 and 0952nm07000); the National Natural Science Foundation of China (Grant Nos. 10804084 and 91123022); the National Key Technology R & D Program, China (Grant No. 2006BAF06B08); and the Specialized Research Fund for the Doctoral Program of Ministry of High Education of China (Grant No. 200802471008).

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摘要： Direct-write atom lithography, one of the potential nanofabrication techniques, is restricted by some difficulties in producing optical masks for the deposition of complex structures. In order to bring a further progress, a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions. The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of chromium atom. The collimation ratio is 0.45 vertically (in x axis), and it is 0.55 horizontally (in y axis). The theoretical model is also simulated, and a success of our structured mirror array is achieved.

关键词: atom lithography, structured mirror array, laser Doppler cooling, two-dimensional collimation

Abstract: Direct-write atom lithography, one of the potential nanofabrication techniques, is restricted by some difficulties in producing optical masks for the deposition of complex structures. In order to bring a further progress, a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions. The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of chromium atom. The collimation ratio is 0.45 vertically (in x axis), and it is 0.55 horizontally (in y axis). The theoretical model is also simulated, and a success of our structured mirror array is achieved.

Key words: atom lithography, structured mirror array, laser Doppler cooling, two-dimensional collimation

中图分类号:  (Atom cooling methods)

  • 37.10.De
37.10.Gh (Atom traps and guides) 42.50.Wk (Mechanical effects of light on material media, microstructures and particles)