Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

doi:10.1088/1674-1056/19/7/075206

中国物理B ›› 2010, Vol. 19 ›› Issue (7): 75206-075206.doi: 10.1088/1674-1056/19/7/075206

Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

徐金洲¹, 石建军¹, 张菁¹, 张琪², 中村圭二², 菅井秀郎²

(1)Department of Applied Physics, College of Science, Donghua University, Shanghai 201620, China; (2)Department of Electrical Engineering, School of Engineering, Chubu University 1200 Matsumoto-cho, Kasugai, Aichi 487-8501, Japan

收稿日期:2009-08-19 出版日期:2010-07-15 发布日期:2010-07-15
基金资助:
Project supported by the National Natural Science Foundation of China (Grant No. 10835004 ), and the 2nd Knowledge Cluster Research Project of Japan: Tokai Region Nanotechnology Manufacturing Cluster (Innovation of Environment Friendly Highly Functional Materials and Devices).

Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

Xu Jin-Zhou (徐金洲)^a, Shi Jian-Jun (石建军)^a, Zhang Jing (张菁)^a, Zhang Qi (张琪)^b, Nakamura Keji (中村圭二)^b, Sugai Hideo (菅井秀郎)^b

^a Department of Applied Physics, College of Science, Donghua University, Shanghai 201620, China; ^b Department of Electrical Engineering, School of Engineering, Chubu University 1200 Matsumoto-cho, Kasugai, Aichi 487-8501, Japan

Received:2009-08-19 Online:2010-07-15 Published:2010-07-15
Supported by:
Project supported by the National Natural Science Foundation of China (Grant No. 10835004 ), and the 2nd Knowledge Cluster Research Project of Japan: Tokai Region Nanotechnology Manufacturing Cluster (Innovation of Environment Friendly Highly Functional Materials and Devices).

摘要/Abstract

摘要： The hairpin probe using microwave resonance in plasma is applicable to high pressure 1.33×10³—1.01×10⁵ Pa)) as developed recently. In this work, an analytic model of the hairpin resonator probe surrounded by a thin dielectric layer and a sheath layer is proposed. The correction factor due to these surroundings is analytically found and confirmed by electromagnetic field finite difference time domain simulation, thus enabling the accurate measurement of electron density in a high-pressure non-equilibrium uniform discharge.

Abstract: The hairpin probe using microwave resonance in plasma is applicable to high pressure 1.33×10³—1.01×10⁵ Pa)) as developed recently. In this work, an analytic model of the hairpin resonator probe surrounded by a thin dielectric layer and a sheath layer is proposed. The correction factor due to these surroundings is analytically found and confirmed by electromagnetic field finite difference time domain simulation, thus enabling the accurate measurement of electron density in a high-pressure non-equilibrium uniform discharge.

Key words: hairpin resonator probe, simulation, high-pressure plasma, transmission line model

中图分类号: (Radio-frequency and microwave measurements)

52.70.Gw

52.70.Ds (Electric and magnetic measurements) 52.40.Kh (Plasma sheaths) 52.25.Mq (Dielectric properties) 52.65.-y (Plasma simulation)

徐金洲, 石建军, 张菁, 张琪, 中村圭二, 菅井秀郎. Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath[J]. 中国物理B, 2010, 19(7): 75206-075206.

Xu Jin-Zhou (徐金洲), Shi Jian-Jun (石建军), Zhang Jing (张菁), Zhang Qi (张琪), Nakamura Keji (中村圭二), Sugai Hideo (菅井秀郎). Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath[J]. Chin. Phys. B, 2010, 19(7): 75206-075206.

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Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

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