The influence of electric field on the photodetachment of H- near a metal surface

doi:10.1088/1674-1056/19/6/063402

中国物理B ›› 2010, Vol. 19 ›› Issue (6): 63402-063402.doi: 10.1088/1674-1056/19/6/063402

The influence of electric field on the photodetachment of H^- near a metal surface

黄凯云, 王德华

School of Physics, Ludong University, Yantai 264025, China

收稿日期:2009-10-14 出版日期:2010-06-15 发布日期:2010-06-15
基金资助:
Project supported by the National Natural Science Foundation of China (Grant No.~10604045), the University Science \& Technology Planning Program of Shandong Province (Grant No.~J09LA02), and the Discipline Construction Fund of Ludong University.

The influence of electric field on the photodetachment of H^- near a metal surface

Huang Kai-Yun(黄凯云) and Wang De-Hua(王德华)^†

School of Physics, Ludong University, Yantai 264025, China

Received:2009-10-14 Online:2010-06-15 Published:2010-06-15
Supported by:
Project supported by the National Natural Science Foundation of China (Grant No.~10604045), the University Science \& Technology Planning Program of Shandong Province (Grant No.~J09LA02), and the Discipline Construction Fund of Ludong University.

摘要/Abstract

摘要： The influence of electric field on the photodetachment of H^{ - } near a metal surface is investigated based on the closed-orbit theory. It is found that the photodetachment of H^{ - } near a metal surface is not only related to the electric field strength but also to the electric field direction. If the electric field is along the +z axis, it can strengthen the oscillation in the photodetachment cross section. However, if the electric field is along the -z axis, since the direction of electric field force is opposite to that of static-image force caused by the metal surface, the situation becomes much more complicated. When the electric field is very weak, its influence can be neglected. The photodetachment cross section is nearly the same as that when a single metal surface exists. When the electric field strength is strong enough, the electric field force is able to counteract the metallic attraction, therefore no closed orbit is formed. If the electric field continues to increase until its influence becomes dominant, the photodetachment cross section approaches the case of the photodetachment of H^{ - } in an electric field. Our results may be useful for guiding future experimental studies on the photodetachment of negative ions near surfaces.

Abstract: The influence of electric field on the photodetachment of H$^{ - }$ near a metal surface is investigated based on the closed-orbit theory. It is found that the photodetachment of H$^{ - }$ near a metal surface is not only related to the electric field strength but also to the electric field direction. If the electric field is along the $+z$ axis, it can strengthen the oscillation in the photodetachment cross section. However, if the electric field is along the $-z$ axis, since the direction of electric field force is opposite to that of static-image force caused by the metal surface, the situation becomes much more complicated. When the electric field is very weak, its influence can be neglected. The photodetachment cross section is nearly the same as that when a single metal surface exists. When the electric field strength is strong enough, the electric field force is able to counteract the metallic attraction, therefore no closed orbit is formed. If the electric field continues to increase until its influence becomes dominant, the photodetachment cross section approaches the case of the photodetachment of H$^{ - }$ in an electric field. Our results may be useful for guiding future experimental studies on the photodetachment of negative ions near surfaces.

Key words: closed-orbit theory, photodetachment, electric field, metal surface

中图分类号: (Photodetachment of atomic negative ions)

32.80.Gc

34.35.+a (Interactions of atoms and molecules with surfaces) 31.15.-p (Calculations and mathematical techniques in atomic and molecular physics)

黄凯云, 王德华. The influence of electric field on the photodetachment of H^- near a metal surface[J]. 中国物理B, 2010, 19(6): 63402-063402.

Huang Kai-Yun(黄凯云) and Wang De-Hua(王德华). The influence of electric field on the photodetachment of H^- near a metal surface[J]. Chin. Phys. B, 2010, 19(6): 63402-063402.

参考文献 17

[1]	Blumberg W A M, Itano W M and Larson D J 1979 Phys. Rev. A 19 139
[2]	Bryant H C 1987 Phys. Rev. Lett . 58 2412
[3]	Rau A P R and Wong H 1988 Phys. Rev. A 37 632
[4]	Du M L and Delos J B 1988 Phys. Rev. A 38 1896
[5]	Petek H, Weida M J, Nagano H and Ogawa S 1999 Science 288 239
[6]	Siakste J, Borisoy A G and Gauyacq J P 2004 Phys. Rev. Lett. 92 1561015
[7]	Yang G C, Zheng Y Z and Chi X X 2006 J. Phys. B: At. Mol. Opt. Phys. 39 1855
[8]	Wang D H 2007 Eur. Phys. J. D 45 179
[9]	Yang G C, Zheng Y Z and Chi X X 2006 Phys. Rev. A 73 04313
[10]	Wang D H and Yu Y J 2008 Chin. Phys. B 17 1231
[11]	Zhao H J and Du M L 2009 Phys. Rev. A 79 023408
[12]	Rui K K and Yang G C 2009 Surf. Sci. 603 632
[13]	Huang K Y and Wang D H 2010 Acta Phys. Sin. 59 932 (in Chinese)
[14]	Wang D H, Du M L and Lin S L 2006 J. Phys. B: At. Mol. Opt. Phys. 39 3526
[15]	Du M L 2004 Phys. Rev. A 70 055402
[16]	Wethekam S, Mertens A and Winter H 2003 Phys. Rev. Lett. 90 037602
[17]	Lloyd G R, Procter S R and Slftley T 2005 Phys. Rev. Lett . 95 133202

The influence of electric field on the photodetachment of H^- near a metal surface

The influence of electric field on the photodetachment of H^- near a metal surface

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