中国物理B ›› 2008, Vol. 17 ›› Issue (7): 2499-2503.doi: 10.1088/1674-1056/17/7/025

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The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling

罗先刚1, 杜春雷1, 方亮2, 杜惊雷2, 郭小伟2, 王景全2, 张志友2   

  1. (1)Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, China; (2)Physics Department, Sichuan University, Chengdu 610064, China
  • 收稿日期:2007-10-05 修回日期:2007-11-16 出版日期:2008-07-09 发布日期:2008-07-09
  • 基金资助:
    Project supported by the National Basic Research of China (Grant No 2006CD302900-2), the National Natural Science Foundation of China (Grant No 60676024), and the Specialized Research Fund of China for the Doctoral Program of Higher Education (Grant No 20060610006).

The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling

Fang Liang(方亮)a), Du Jing-Lei(杜惊雷)a)†, Guo Xiao-Wei(郭小伟)a), Wang Jing-Quan(王景全)a), Zhang Zhi-You(张志友)a), Luo Xian-Gang(罗先刚)b), and Du Chun-Lei(杜春雷)b)   

  1. a Physics Department, Sichuan University, Chengdu 610064, China; b Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, China
  • Received:2007-10-05 Revised:2007-11-16 Online:2008-07-09 Published:2008-07-09
  • Supported by:
    Project supported by the National Basic Research of China (Grant No 2006CD302900-2), the National Natural Science Foundation of China (Grant No 60676024), and the Specialized Research Fund of China for the Doctoral Program of Higher Education (Grant No 20060610006).

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摘要： The use of an attenuated total reflection-coupling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons (SPPs) was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference time-domain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments.

关键词: surface plasmon polaritons (SPPs), enhancement, interference lithography, resolution

Abstract: The use of an attenuated total reflection-coupling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons (SPPs) was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference time-domain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments.

Key words: surface plasmon polaritons (SPPs), enhancement, interference lithography, resolution

中图分类号:  (Fabrication techniques; lithography, pattern transfer)

  • 42.82.Cr
42.79.Bh (Lenses, prisms and mirrors)