中国物理B ›› 2019, Vol. 28 ›› Issue (7): 74702-074702.doi: 10.1088/1674-1056/28/7/074702

• ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS • 上一篇    下一篇

Direct simulation Monte Carlo study of metal evaporation with collimator in e-beam physical vapor deposition

Xiaoyong Lu(卢肖勇), Junjie Chai(柴俊杰)   

  1. 1 Department of Engineering Physics, Tsinghua University, Beijing 100084, China;
    2 Research Institute of Physics and Chemical Engineering of Nuclear Industry, Tianjin 300180, China
  • 收稿日期:2019-01-11 修回日期:2019-03-27 出版日期:2019-07-05 发布日期:2019-07-05
  • 通讯作者: Xiaoyong Lu E-mail:lu-xy15@mails.tsinghua.edu.cn

Direct simulation Monte Carlo study of metal evaporation with collimator in e-beam physical vapor deposition

Xiaoyong Lu(卢肖勇)1,2, Junjie Chai(柴俊杰)2   

  1. 1 Department of Engineering Physics, Tsinghua University, Beijing 100084, China;
    2 Research Institute of Physics and Chemical Engineering of Nuclear Industry, Tianjin 300180, China
  • Received:2019-01-11 Revised:2019-03-27 Online:2019-07-05 Published:2019-07-05
  • Contact: Xiaoyong Lu E-mail:lu-xy15@mails.tsinghua.edu.cn

摘要:

The flow properties and substrate deposition rate profile, which are the important parameters in electron beam physical vapor deposition, are investigated computationally in this article. Collimators are used to achieve the desired vapor beam and deposition rate profile in some applications. This increases the difficulty measuring boundary conditions and the size of the liquid metal pool inside the collimators. It is accordingly hard to obtain accurate results from numerical calculations. In this article, two-dimensional direct simulation Monte Carlo (DSMC) codes are executed to quantify the influence of uncertainties of boundary conditions and pool sizes. Then, three-dimensional DSMC simulations are established to simulate cerium and neodymium evaporation with the collimator. Experimental and computational results of substrate deposition rate profile are in excellent agreement at various evaporation rates and substrate heights. The results show that the DSMC method can assist in metal evaporation with a collimator.

关键词: metal evaporation, collimator, deposition thickness profile

Abstract:

The flow properties and substrate deposition rate profile, which are the important parameters in electron beam physical vapor deposition, are investigated computationally in this article. Collimators are used to achieve the desired vapor beam and deposition rate profile in some applications. This increases the difficulty measuring boundary conditions and the size of the liquid metal pool inside the collimators. It is accordingly hard to obtain accurate results from numerical calculations. In this article, two-dimensional direct simulation Monte Carlo (DSMC) codes are executed to quantify the influence of uncertainties of boundary conditions and pool sizes. Then, three-dimensional DSMC simulations are established to simulate cerium and neodymium evaporation with the collimator. Experimental and computational results of substrate deposition rate profile are in excellent agreement at various evaporation rates and substrate heights. The results show that the DSMC method can assist in metal evaporation with a collimator.

Key words: metal evaporation, collimator, deposition thickness profile

中图分类号:  (Rarefied gas dynamics)

  • 47.45.-n
51.10.+y (Kinetic and transport theory of gases)