Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity

doi:10.1088/1674-1056/24/1/017802

中国物理B ›› 2015, Vol. 24 ›› Issue (1): 17802-017802.doi: 10.1088/1674-1056/24/1/017802

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇下一篇

Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity

王子文, 蔡家琦, 吴以治, 王会杰, 许小亮

Department of Physics, University of Science and Technology of China, Hefei 230026, China

收稿日期:2014-06-28 修回日期:2014-08-04 出版日期:2015-01-05 发布日期:2015-01-05
基金资助:
Project supported by the National Natural Science Foundation of China (Grant No. 51272246) and the Scientific and Technological Research Foundation of Anhui Province, China (Grant No. 12010202035).

Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity

Wang Zi-Wen (王子文), Cai Jia-Qi (蔡家琦), Wu Yi-Zhi (吴以治), Wang Hui-Jie (王会杰), Xu Xiao-Liang (许小亮)

Department of Physics, University of Science and Technology of China, Hefei 230026, China

Received:2014-06-28 Revised:2014-08-04 Online:2015-01-05 Published:2015-01-05
Contact: Xu Xiao-Liang E-mail:xlxu@ustc.edu.cn
Supported by:
Project supported by the National Natural Science Foundation of China (Grant No. 51272246) and the Scientific and Technological Research Foundation of Anhui Province, China (Grant No. 12010202035).

摘要/Abstract

摘要：

Highly ordered silicon nanorod (SiNR) arrays with controllable geometry are fabricated via nanosphere lithography and metal-assisted chemical etching. It is demonstrated that the key to achieving a high-quality metal mask is to construct a non-close-packed template that can be removed with negligible damage to the mask. Hydrophobicity of SiNR arrays of different geometries is also studied. It is shown that the nanorod structures are effectively quasi-hydrophobic with a contact angle as high as 142°, which would be useful in self-cleaning nanorod-based device applications.

关键词: silicon nanorod array, hydrophobicity, self-cleaning, metal-assisted chemical etching

Abstract:

Key words: silicon nanorod array, hydrophobicity, self-cleaning, metal-assisted chemical etching

中图分类号: (Nanorods)

78.67.Qa

68.08.Bc (Wetting)

王子文, 蔡家琦, 吴以治, 王会杰, 许小亮. Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity[J]. 中国物理B, 2015, 24(1): 17802-017802.

Wang Zi-Wen (王子文), Cai Jia-Qi (蔡家琦), Wu Yi-Zhi (吴以治), Wang Hui-Jie (王会杰), Xu Xiao-Liang (许小亮). Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity[J]. Chin. Phys. B, 2015, 24(1): 17802-017802.

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Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity

Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity

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