中国物理B ›› 2009, Vol. 18 ›› Issue (1): 183-188.doi: 10.1088/1674-1056/18/1/029

• CLASSICAL AREAS OF PHENOMENOLOGY • 上一篇    下一篇

Phase zone photon sieve

贾佳, 谢常青   

  1. Key Laboratory of Nano-Fabrication and Novel Device Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 收稿日期:2008-04-18 修回日期:2008-08-15 出版日期:2009-01-20 发布日期:2009-01-20
  • 基金资助:
    Project supported by the National Key Basic Research Special Foundation of China (Grant No 2007CB935302) and the National Natural Science Foundation of China (Grant No 60825403).

Phase zone photon sieve

Jia Jia(贾佳)† and Xie Chang-Qing(谢常青)   

  1. Key Laboratory of Nano-Fabrication and Novel Device Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • Received:2008-04-18 Revised:2008-08-15 Online:2009-01-20 Published:2009-01-20
  • Supported by:
    Project supported by the National Key Basic Research Special Foundation of China (Grant No 2007CB935302) and the National Natural Science Foundation of China (Grant No 60825403).

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摘要： A novel diffractive optical element, named phase zone photon sieve (PZPS), is presented. There are three kinds of phase plates in PZPSs: PZPS1, PZPS2, and PZPS3. Each of the PZPSs has its own structure and is made on quartz substrate by etching. The three PZPSs have stronger diffraction peak intensity than a photon sieve (PS) when the margin pinhole and zone line width are kept the same. The PZPS3 can produce a smaller central diffractive spot than the ordinary PS with the same number of zones on the Fresnel zone plate. We have given the design method for and the simulation of PZPS and PS. PZPS has potential applications in optical maskless lithography.

Abstract: A novel diffractive optical element, named phase zone photon sieve (PZPS), is presented. There are three kinds of phase plates in PZPSs: PZPS1, PZPS2, and PZPS3. Each of the PZPSs has its own structure and is made on quartz substrate by etching. The three PZPSs have stronger diffraction peak intensity than a photon sieve (PS) when the margin pinhole and zone line width are kept the same. The PZPS3 can produce a smaller central diffractive spot than the ordinary PS with the same number of zones on the Fresnel zone plate. We have given the design method for and the simulation of PZPS and PS. PZPS has potential applications in optical maskless lithography.

Key words: photon sieve, Fresnel zone plate, diffractive optics

中图分类号:  (Filters, zone plates, and polarizers)

  • 42.79.Ci
42.25.Fx (Diffraction and scattering)