中国物理B ›› 2006, Vol. 15 ›› Issue (3): 575-579.doi: 10.1088/1009-1963/15/3/022

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Surface properties of diamond-like carbon films prepared by CVD and PVD methods

刘东平1, 陈宝祥1, 刘艳红2   

  1. (1)Department of Mathematics and Physics, Dalian Nationality University, Dalian 116600, China; (2)State Key Laboratory for Material Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024,China
  • 收稿日期:2005-08-12 修回日期:2005-10-12 出版日期:2006-03-20 发布日期:2006-03-20
  • 基金资助:
    Project supported by National Natural Science Foundation of China (Grant No 10405005).

Surface properties of diamond-like carbon films prepared by CVD and PVD methods

Liu Dong-Ping (刘东平)a,  Liu Yan-Hong (刘艳红)b, Chen Bao-Xiang (陈宝祥)a   

  1. a Department of Mathematics and Physics, Dalian Nationality University, Dalian 116600, China; b State Key Laboratory for Material Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China
  • Received:2005-08-12 Revised:2005-10-12 Online:2006-03-20 Published:2006-03-20
  • Supported by:
    Project supported by National Natural Science Foundation of China (Grant No 10405005).

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摘要： Diamond-like carbon (DLC) films have been deposited using three different techniques: (a) electron cyclotron resonance---plasma source ion implantation, (b) low-pressure dielectric barrier discharge, (c) filtered---pulsed cathodic arc discharge. The surface and mechanical properties of these films are compared using atomic force microscope-based tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and sp$^{3}$ hybridized carbon while the soft surface layers of tetrahedral amorphous carbon (ta-C) films have graphite-like structure. The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and sp$^{3}$ hybridized carbon enriched surface layers. The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.

关键词: diamond-like carbon film, film deposition, atomic force microscope

Abstract: Diamond-like carbon (DLC) films have been deposited using three different techniques: (a) electron cyclotron resonance---plasma source ion implantation, (b) low-pressure dielectric barrier discharge, (c) filtered---pulsed cathodic arc discharge. The surface and mechanical properties of these films are compared using atomic force microscope-based tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and sp$^{3}$ hybridized carbon while the soft surface layers of tetrahedral amorphous carbon (ta-C) films have graphite-like structure. The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and sp$^{3}$ hybridized carbon enriched surface layers. The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.

Key words: diamond-like carbon film, film deposition, atomic force microscope

中图分类号:  (Defects and impurities: doping, implantation, distribution, concentration, etc.)

  • 68.55.Ln
68.55.-a (Thin film structure and morphology) 52.77.Dq (Plasma-based ion implantation and deposition) 81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)) 68.55.A- (Nucleation and growth) 68.35.Fx (Diffusion; interface formation)