中国物理B ›› 2006, Vol. 15 ›› Issue (3): 575-579.doi: 10.1088/1009-1963/15/3/022
刘东平1, 陈宝祥1, 刘艳红2
Liu Dong-Ping (刘东平)a, Liu Yan-Hong (刘艳红)b, Chen Bao-Xiang (陈宝祥)a
摘要: Diamond-like carbon (DLC) films have been deposited using three different techniques: (a) electron cyclotron resonance---plasma source ion implantation, (b) low-pressure dielectric barrier discharge, (c) filtered---pulsed cathodic arc discharge. The surface and mechanical properties of these films are compared using atomic force microscope-based tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and sp$^{3}$ hybridized carbon while the soft surface layers of tetrahedral amorphous carbon (ta-C) films have graphite-like structure. The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and sp$^{3}$ hybridized carbon enriched surface layers. The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.
中图分类号: (Defects and impurities: doping, implantation, distribution, concentration, etc.)