中国物理B ›› 2004, Vol. 13 ›› Issue (1): 65-70.doi: 10.1088/1009-1963/13/1/013

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Influence of ion species ratio on grid-enhanced plasma source ion implantation

王久丽1, 张谷令1, 刘元富1, 刘赤子1, 杨思泽2, 王友年3   

  1. (1)Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China; (2)Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China; State Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams, Dalian University of Technology, Dalian 116023, China; (3)State Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams, Dalian University of Technology, Dalian 116023, China
  • 收稿日期:2003-05-23 修回日期:2003-06-02 出版日期:2004-01-22 发布日期:2007-03-22
  • 基金资助:
    Project supported by the National High Technology Development Program of China (Grant No 2002A331020), the National Natural Science Foundation of China (Grant Nos 50071068 and 10275088), the Science and Technology Program of Beijing Municipal Science and

Influence of ion species ratio on grid-enhanced plasma source ion implantation

Wang Jiu-Li (王久丽)a, Zhang Gu-Ling (张谷令)a, Liu Yuan-Fu (刘元富)a, Wang You-Nian (王友年)b, Liu Chi-Zi (刘赤子)a, Yang Si-Ze (杨思泽)ab   

  1. a Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China; b State Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams, Dalian University of Technology, Dalian 116023, China
  • Received:2003-05-23 Revised:2003-06-02 Online:2004-01-22 Published:2007-03-22
  • Supported by:
    Project supported by the National High Technology Development Program of China (Grant No 2002A331020), the National Natural Science Foundation of China (Grant Nos 50071068 and 10275088), the Science and Technology Program of Beijing Municipal Science and

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摘要： Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique to modify the inner-surface properties of a cylindrical bore. In this paper, a two-ion fluid model describing nitrogen molecular ions N_2^+ and atomic ions N^+ is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process, which is an extension of our previous calculations in which only N_2^+ was considered. Calculations are concentrated on the results of ion dose and impact energy on the target for different ion species ratios in the core plasma. The calculated results show that more atomic ions N^+ in the core plasma can raise the ion impact energy and reduce the ion dose on the target.

关键词: plasma simulation, plasma sheath, two-ion fluid model, grid-enhanced plasma source ion implantation

Abstract: Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique to modify the inner-surface properties of a cylindrical bore. In this paper, a two-ion fluid model describing nitrogen molecular ions N$_2^+$ and atomic ions N$^+$ is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process, which is an extension of our previous calculations in which only N$_2^+$ was considered. Calculations are concentrated on the results of ion dose and impact energy on the target for different ion species ratios in the core plasma. The calculated results show that more atomic ions N$^+$ in the core plasma can raise the ion impact energy and reduce the ion dose on the target.

Key words: plasma simulation, plasma sheath, two-ion fluid model, grid-enhanced plasma source ion implantation

中图分类号:  (Plasma sources)

  • 52.50.Dg
52.77.Dq (Plasma-based ion implantation and deposition) 52.65.-y (Plasma simulation) 52.40.Kh (Plasma sheaths)