[1] Chiper A and Borcia G 2013 Plasma Chem. Plasma Process. 33 553 [2] Ran J X, Chen Q Y, Zhou Y X, Tian S, Wu J C, Li P R, Li Q, Zhang X X and Li X C 2025 Plasma Processes Polym. 22 e70023 [3] Chauvin J, Judée F, Yousfi M, Vicendo P and Merbahi N 2017 Sci. Rep. 7 4562 [4] Khlyustova A, Labay C, Machala Z, Ginebra M P and Canal C 2019 Front. Chem. Sci. Eng. 13 238 [5] Liao X Y, Liu D H, Xiang Q S, Ahn J, Chen S G, Ye X Q and Ding T 2017 Food Control 75 83 [6] Bourke P, Ziuzina D, Han L, Cullen P J and Gilmore B F 2017 J. Appl. Microbiol. 123 308 [7] Boeuf J P, Bernecker B, Callegari T, Blanco S and Fournier R 2012 Appl. Phys. Lett. 100 244108 [8] Li X C, Ge Y Q,WanWJ, Zhang X X, Sun H, Ran J X, Pang X X,Wu K Y and Jia P Y 2025 Phys. Scr. 100 075602 [9] Fang J L, Zhang Y R, Lu C Z, Gu L L, Xu S F, Guo Y and Shi J J 2024 Chin. Phys. B 33 015201 [10] Liu G M, Chen L, Zhao Z B and Song P 2023 Chin. Phys. B 32 125205 [11] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400 [12] Han R, Dong L F, Huang J Y, Sun H Y, Liu B B and Mi Y L 2019 Chin. Phys. B 28 075204 [13] Callegari T, Bernecker B and Boeuf J P 2014 Plasma Sources Sci. Technol. 23 054003 [14] Trelles J P 2016 J. Phys. D: Appl. Phys. 49 393002 [15] Brandenburg R 2017 Plasma Sources Sci. Technol. 26 053001 [16] Ouyang J T, Li B, He F and Dai D 2018 Plasma Sci. Technol 20 103002 [17] Dong L F, Zhang L J, He Y N, Wei T, Li Y H, Li C and Pan Y Y 2024 Appl. Phys. Lett. 125 104101 [18] Wu K Y,Wu J C, Jia B Y, Ren C H, Kang P C, Jia P Y and Li X C 2020 Phys. Plasma 27 082308 [19] Qiao Y J, Li B and Ouyang J T 2016 Phys. Plasma 23 013510 [20] Guikema J, Miller N, Niehof J, Klein M and Walhout M 2000 Phys. Rev. Lett. 85 3817 [21] Duan X X, Xu S W, Liu J, He F and Ouyang J T 2011 IEEE Trans. Plasma Sci. 39 2074 [22] Itoh H and Suzuki S 2014 Plasma Sources Sci. Technol. 23 054014 [23] Stollenwerk L, Amiranashvili S and Purwins H G 2006 New J. Phys. 8 217 [24] Zhang Y R, Han Q H, Fang J L, Guo Y and Shi J J 2023 Chin. Phys. B 32 025201 [25] Shi J J, Liu D W and Kong M G 2006 Appl. Phys. Lett. 89 081502 [26] Li B, Chen Q and Liu Z W 2010 Appl. Phys. Lett. 96 041502 [27] Shi J J and Kong M G 2007 Appl. Phys. Lett. 90 111502 [28] Li S, Sun J Z, Sun R, Pan J, Wang L, Chen C, Chen Q and Liu Z W 2022 Materials 15 7647 [29] Yang L Z, Liu Z W, Mao Z G, Li S and Chen Q 2016 Jpn. J. Appl. Phys. 56 01AC02 [30] Li S, Liu Z W, Cai H P and Chen Q 2011 IEEE Trans. Plasma Sci. 39 2134 [31] Balcon N, Aanesland A and Boswell R 2007 Plasma Sources Sci. Technol. 16 217 [32] Shi J J, Zhang J, Qiu G, Walsh J L and Kong M G 2008 Appl. Phys. Lett. 93 041502 [33] Sun J Z, Wang Q, Ding Z F, Li X C and Wang D Z 2011 Phys. Plasma 18 123502 [34] Huo W G, Zhu Y T, Liu C S and Ding Z F 2018 Phys. Plasma 25 093507 [35] Du M Q and Ding Z F 2022 AIP Adv. 12 085217 [36] Liu D W, Shi J J and Kong M G 2007 Appl. Phys. Lett. 90 041502 [37] Zhou W H, Zhang D X, Duan X H, Zhu X, Liu F and Fang Z 2024 Plasma Sci. Technol. 26 094008 [38] Park J, Henins I, Herrmann H W, Selwyn G S and Hicks R F 2001 J. Appl. Phys. 89 20 [39] Lazarou C, Chiper A S, Anastassiou C, Topala I, Mihaila I, Pohoata V and Georghiou G E 2019 J. Phys. D: Appl. Phys. 52 195203 [40] Fan W L, Sheng Z M, Dong L F, Liu F C, Zhong X X, Cui Y Q, Hao F and Du T 2017 Sci. Rep. 7 8368 [41] Brauer I, Bode M, Ammelt E and Purwins H G 2000 Phys. Rev. Lett. 84 4104 [42] Li B, Dong L F, Zhang C, Shen Z K and Zhang X P 2014 J. Phys. D: Appl. Phys. 47 055205 |