中国物理B ›› 2025, Vol. 34 ›› Issue (2): 20601-020601.doi: 10.1088/1674-1056/ad9e9a

所属专题： Featured Column — INSTRUMENTATION AND MEASUREMENT

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Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant

Jingtong Feng(冯婧桐)1,2,3,4,5,6, Rao Xu(徐娆)1,2,3,4,5,6, Ziruo Wu(吴子若)7, Lihua Lei(雷李华)8, Yingfan Xiong(熊英凡)1,2,3,4,5,6, Zhaohui Tang(唐朝辉)1,2,3,4,5,6, Guangxu Xiao(肖光旭)1,2,3,4,5,6, Yuying Xie(解钰莹)1,2,3,4,5,6,†, Dongbai Xue(薛栋柏)1,2,3,4,5,6, Xiao Deng(邓晓)1,2,3,4,5,6, Xinbin Cheng(程鑫彬)1,2,3,4,5,6, and Tongbao Li(李同保)1,2,3,4,5,6   

  1. 1 National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University, Shanghai 200092, China;
    2 Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;
    3 MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai 200092, China;
    4 Shanghai Frontiers Science Center of Digital Optics, Tongji University, Shanghai 200092, China;
    5 Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University, Shanghai 200092, China;
    6 School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;
    7 Shanghai Metric Optics Technology Co., Ltd., Shanghai 201108, China;
    8 Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China
  • 收稿日期:2024-09-29 修回日期:2024-11-12 接受日期:2024-12-13 出版日期:2025-02-15 发布日期:2025-01-15
  • 通讯作者: Yuying Xie E-mail:23310117@tongji.edu.cn
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 61925504 and 52475563), the National Key Research and Development Program of China (Grant Nos. 2022YFF0607600 and 2022YFF0605502), Key Laboratory of Metrology and Calibration Technology Fund Project (Grant No. JLKG2023001B001), and Aeronautical Science Foundation Project (Grant No. 20230056038001).

Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant

Jingtong Feng(冯婧桐)1,2,3,4,5,6, Rao Xu(徐娆)1,2,3,4,5,6, Ziruo Wu(吴子若)7, Lihua Lei(雷李华)8, Yingfan Xiong(熊英凡)1,2,3,4,5,6, Zhaohui Tang(唐朝辉)1,2,3,4,5,6, Guangxu Xiao(肖光旭)1,2,3,4,5,6, Yuying Xie(解钰莹)1,2,3,4,5,6,†, Dongbai Xue(薛栋柏)1,2,3,4,5,6, Xiao Deng(邓晓)1,2,3,4,5,6, Xinbin Cheng(程鑫彬)1,2,3,4,5,6, and Tongbao Li(李同保)1,2,3,4,5,6   

  1. 1 National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University, Shanghai 200092, China;
    2 Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;
    3 MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai 200092, China;
    4 Shanghai Frontiers Science Center of Digital Optics, Tongji University, Shanghai 200092, China;
    5 Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University, Shanghai 200092, China;
    6 School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;
    7 Shanghai Metric Optics Technology Co., Ltd., Shanghai 201108, China;
    8 Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China
  • Received:2024-09-29 Revised:2024-11-12 Accepted:2024-12-13 Online:2025-02-15 Published:2025-01-15
  • Contact: Yuying Xie E-mail:23310117@tongji.edu.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 61925504 and 52475563), the National Key Research and Development Program of China (Grant Nos. 2022YFF0607600 and 2022YFF0605502), Key Laboratory of Metrology and Calibration Technology Fund Project (Grant No. JLKG2023001B001), and Aeronautical Science Foundation Project (Grant No. 20230056038001).

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摘要： Traceability is the fundamental premise of all metrological activities. The establishment of a traceability chain characterized by a shortened structure, while simultaneously enabling on-site traceability, represents a key trend in the advancement of metrology. This study explores the periodic accuracy and overall uniformity of self-traceable gratings, employing multilayer film gratings with a nominal period of 25.00 nm as the medium. We present a comparative analysis of measurement capabilities in a self-traceable grating calibration system characterized by a 'top-down' calibration approach and a Si lattice constant calibration system characterized by a 'bottom-up' calibration approach. The results indicate that the values obtained for the multilayer film grating periods, calibrated using the self-traceable grating system, are 24.40 nm with a standard deviation of 0.11 nm. By comparing with the values derived from the Si lattice constant, which yield 24.34 nm with a standard deviation of 0.14 nm, the validity and feasibility of the self-traceable calibration system are confirmed. This system extends and complements existing metrological frameworks, offering a precise pathway for traceability in precision engineering and nanotechnology research.

关键词: nanometrology, self-traceable standard material, Si lattice constant

Abstract: Traceability is the fundamental premise of all metrological activities. The establishment of a traceability chain characterized by a shortened structure, while simultaneously enabling on-site traceability, represents a key trend in the advancement of metrology. This study explores the periodic accuracy and overall uniformity of self-traceable gratings, employing multilayer film gratings with a nominal period of 25.00 nm as the medium. We present a comparative analysis of measurement capabilities in a self-traceable grating calibration system characterized by a 'top-down' calibration approach and a Si lattice constant calibration system characterized by a 'bottom-up' calibration approach. The results indicate that the values obtained for the multilayer film grating periods, calibrated using the self-traceable grating system, are 24.40 nm with a standard deviation of 0.11 nm. By comparing with the values derived from the Si lattice constant, which yield 24.34 nm with a standard deviation of 0.14 nm, the validity and feasibility of the self-traceable calibration system are confirmed. This system extends and complements existing metrological frameworks, offering a precise pathway for traceability in precision engineering and nanotechnology research.

Key words: nanometrology, self-traceable standard material, Si lattice constant

中图分类号:  (Metrology)

  • 06.20.-f
06.20.fb (Standards and calibration) 81.07.-b (Nanoscale materials and structures: fabrication and characterization)