中国物理B ›› 2024, Vol. 33 ›› Issue (6): 68103-068103.doi: 10.1088/1674-1056/ad35b0
Effect of trace oxygen on plasma nitriding of titanium foil
Hai-Tao Zhou(周海涛)1, Xi-Ya Xiong(熊希雅)1, Ke-Xin Ma(马可欣)1, Bing-Wei Luo(罗炳威)1, Fei Luo(罗飞)1, and Cheng-Min Shen(申承民)2,†
- 1 Beijing Institute of Aeronautical Materials, Aero Engine Corporation of China, Beijing 100095, China;
2 Beijing National Laboratory of Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
Effect of trace oxygen on plasma nitriding of titanium foil
Hai-Tao Zhou(周海涛)1, Xi-Ya Xiong(熊希雅)1, Ke-Xin Ma(马可欣)1, Bing-Wei Luo(罗炳威)1, Fei Luo(罗飞)1, and Cheng-Min Shen(申承民)2,†
- 1 Beijing Institute of Aeronautical Materials, Aero Engine Corporation of China, Beijing 100095, China;
2 Beijing National Laboratory of Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
摘要： Titanium nitride films are prepared by plasma enhanced chemical vapor deposition method on titanium foil using N$_{2}$ as precursor. In order to evaluate the effect of oxygen on the growth of titanium nitride films, a small amount of O$_{2}$ is introduced into the preparation process. The study indicates that trace O$_{2}$ addition into the reaction chamber gives rise to significant changes on the color and micro-morphology of the foil, featuring dense and long nano-wires. The as-synthesized nanostructures are characterized by various methods and identified as TiN, Ti$_{2}$N, and TiO$_{2}$ respectively. Moreover, the experiment results show that oxide nanowire has a high degree of crystallinity and the nitrides present specific orientation relationships with the titanium matrix.
中图分类号: (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
- 81.15.Gh