中国物理B ›› 2014, Vol. 23 ›› Issue (3): 37201-037201.doi: 10.1088/1674-1056/23/3/037201

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Residual compressive stress and intensity of infrared absorption of cubic BN films prepared by plasma enhanced chemical vapor deposition

杨杭生a, 金盼盼a, 徐亚伯b, 李海洋b   

  1. a State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China;
    b Department of Physics, Zhejiang University, Hangzhou 310027, China
  • 收稿日期:2013-05-07 修回日期:2013-08-21 出版日期:2014-03-15 发布日期:2014-03-15
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 50772096 and 61176051).

Residual compressive stress and intensity of infrared absorption of cubic BN films prepared by plasma enhanced chemical vapor deposition

Yang Hang-Sheng (杨杭生)a, Jin Pan-Pan (金盼盼)a, Xu Ya-Bo (徐亚伯)b, Li Hai-Yang (李海洋)b   

  1. a State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China;
    b Department of Physics, Zhejiang University, Hangzhou 310027, China
  • Received:2013-05-07 Revised:2013-08-21 Online:2014-03-15 Published:2014-03-15
  • Contact: Yang Hang-Sheng E-mail:hsyang@zju.edu.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 50772096 and 61176051).

摘要: Theoretical and experimental investigations on the dependence of the intensity of infrared (IR) absorption of polycrystalline cubic boron nitride thin films under the residual compressive stress conditions have been performed. Our results indicate that the intensity of the IR absorption is proportional to the total degree of freedom of all the ions in the ordered regions. The reduction of interstitial Ar atom concentration, which causes the increase in the ordered regions of cubic boron nitride (cBN) crystallites, could be one cause for the increase in the intensity of IR absorption after residual compressive stress relaxation. Theoretical derivation is in good agreement with the experimental results concerning the IR absorption intensity and the Ar interstitial atom concentration in cubic boron nitride films measured by energy dispersion X-ray spectroscopy. Our results also suggest that the interstitial Ar is the origin of residual compressive stress accumulation in plasma enhanced cBN film deposition.

关键词: infrared absorption, compressive stress, degree of freedom, interstitial atom

Abstract: Theoretical and experimental investigations on the dependence of the intensity of infrared (IR) absorption of polycrystalline cubic boron nitride thin films under the residual compressive stress conditions have been performed. Our results indicate that the intensity of the IR absorption is proportional to the total degree of freedom of all the ions in the ordered regions. The reduction of interstitial Ar atom concentration, which causes the increase in the ordered regions of cubic boron nitride (cBN) crystallites, could be one cause for the increase in the intensity of IR absorption after residual compressive stress relaxation. Theoretical derivation is in good agreement with the experimental results concerning the IR absorption intensity and the Ar interstitial atom concentration in cubic boron nitride films measured by energy dispersion X-ray spectroscopy. Our results also suggest that the interstitial Ar is the origin of residual compressive stress accumulation in plasma enhanced cBN film deposition.

Key words: infrared absorption, compressive stress, degree of freedom, interstitial atom

中图分类号:  (III-V and II-VI semiconductors)

  • 72.80.Ey
81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))