Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry

doi:10.1088/1674-1056/21/1/010701

中国物理B ›› 2012, Vol. 21 ›› Issue (1): 10701-010701.doi: 10.1088/1674-1056/21/1/010701

Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry

张继涛, 吴学健, 李岩

State Key Laboratory of Precision Measurement Technology & Instruments, Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084, China

收稿日期:2011-06-15 修回日期:2011-07-07 出版日期:2012-01-15 发布日期:2012-01-20
基金资助:
Project supported by the National Key Technology Research and Development Program of the Ministry of Science and Technology of China (Grant No. 2006BAF06B06) and the Tsinghua University Initiative Scientific Research Program, China (Grant No. 2009THZ06057

Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry

Zhang Ji-Tao(张继涛)^†, Wu Xue-Jian(吴学健), and Li Yan(李岩)

State Key Laboratory of Precision Measurement Technology & Instruments, Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084, China

Received:2011-06-15 Revised:2011-07-07 Online:2012-01-15 Published:2012-01-20
Supported by:
Project supported by the National Key Technology Research and Development Program of the Ministry of Science and Technology of China (Grant No. 2006BAF06B06) and the Tsinghua University Initiative Scientific Research Program, China (Grant No. 2009THZ06057

摘要/Abstract

摘要： The effect of a spherical shape on the measurement result of spectroscopic ellipsometry (SE) is analyzed, and a method to eliminate this effect is proposed. Based on the simulation result of the SE measurement on a silicon sphere by ray tracking, we find that the sphere makes the parallel incident beam of the SE be divergent after reflection, and the measurement error of the SE caused by this phenomenon is explained by the mixed polarization theory. By settling an aperture in front of the detector of the SE, we can almost eliminate the error. For the silicon sphere with a diameter of 94 mm used in the Avogadro project, the thickness error of the oxide layer caused by the spherical shape can be reduced from 0.73 nm to 0.04 nm by using the proposed method. The principle of the method and the results of the experimental verification are presented.

关键词: spectroscopic ellipsometry, silicon sphere, Avogadro constant, metrology

Abstract: The effect of a spherical shape on the measurement result of spectroscopic ellipsometry (SE) is analyzed, and a method to eliminate this effect is proposed. Based on the simulation result of the SE measurement on a silicon sphere by ray tracking, we find that the sphere makes the parallel incident beam of the SE be divergent after reflection, and the measurement error of the SE caused by this phenomenon is explained by the mixed polarization theory. By settling an aperture in front of the detector of the SE, we can almost eliminate the error. For the silicon sphere with a diameter of 94 mm used in the Avogadro project, the thickness error of the oxide layer caused by the spherical shape can be reduced from 0.73 nm to 0.04 nm by using the proposed method. The principle of the method and the results of the experimental verification are presented.

Key words: spectroscopic ellipsometry, silicon sphere, Avogadro constant, metrology

中图分类号: (Polarimeters and ellipsometers)

07.60.Fs

06.20.Jr (Determination of fundamental constants) 06.20.-f (Metrology)

张继涛, 吴学健, 李岩. Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry[J]. 中国物理B, 2012, 21(1): 10701-010701.

Zhang Ji-Tao(张继涛), Wu Xue-Jian(吴学健), and Li Yan(李岩) . Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry[J]. Chin. Phys. B, 2012, 21(1): 10701-010701.

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Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry

Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry

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