Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma

doi:10.1088/1674-1056/20/1/014701

中国物理B ›› 2011, Vol. 20 ›› Issue (1): 14701-014701.doi: 10.1088/1674-1056/20/1/014701

• CLASSICAL AREAS OF PHENOMENOLOGY • 上一篇下一篇

Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma

Sankar Moni Borah, Arup Ratan Pal, Heremba Bailung, Joyanti Chutia

Plasma Physics Laboratory, Material Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Guwahati 781035, Assam, India

收稿日期:2010-06-09 修回日期:2010-07-26 出版日期:2011-01-15 发布日期:2011-01-15
基金资助:
Project supported by the Council of Scientific and Industrial Research -- Senior Research Fellowship, Government of India grant (Award No. 9/835(6)/2008/EMR-I).

Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma

Sankar Moni Borah,Arup Ratan Pal,Heremba Bailung,andJoyanti Chutia^†

Plasma Physics Laboratory, Material Sciences Division, Institute of Advanced Study in Science and Technology, Paschim Boragaon, Guwahati 781035, Assam, India

Received:2010-06-09 Revised:2010-07-26 Online:2011-01-15 Published:2011-01-15
Supported by:
Project supported by the Council of Scientific and Industrial Research–Senior Research Fellowship, Government of India grant (Award No. 9/835(6)/2008/EMR-I).

摘要/Abstract

摘要： Study of electron drift velocity caused by Etimes B motion is done with the help of a Mach probe in a dc cylindrical magnetron sputtering system at different plasma discharge parameters like discharge voltage, gas pressure and applied magnetic field strength. The interplay of the electron drift with the different discharge parameters has been investigated. Strong radial variation of the electron drift velocity is observed and is found to be maximum near the cathode and it decreases slowly with the increase of radial distance from the cathode. The sheath electric field, E measured experimentally from potential profile curve using an emissive probe is contributed to the observed radial variation of the electron drift velocity. The measured values of the drift velocities are also compared with the values from the conventional theory using the experimental values of electric and magnetic fields. This study of the drift velocity variation is helpful in providing a useful insight for determining the discharge conditions and parameters for sputter deposition of thin film.

Abstract: Study of electron drift velocity caused by E×B motion is done with the help of a Mach probe in a dc cylindrical magnetron sputtering system at different plasma discharge parameters like discharge voltage, gas pressure and applied magnetic field strength. The interplay of the electron drift with the different discharge parameters has been investigated. Strong radial variation of the electron drift velocity is observed and is found to be maximum near the cathode and it decreases slowly with the increase of radial distance from the cathode. The sheath electric field, E measured experimentally from potential profile curve using an emissive probe is contributed to the observed radial variation of the electron drift velocity. The measured values of the drift velocities are also compared with the values from the conventional theory using the experimental values of electric and magnetic fields. This study of the drift velocity variation is helpful in providing a useful insight for determining the discharge conditions and parameters for sputter deposition of thin film.

Key words: electron drift velocity, Mach probe, cylindrical magnetron, sputtering

中图分类号: (Velocity measurements)

47.80.Cb

52.35.Kt (Drift waves) 84.40.Fe (Microwave tubes (e.g., klystrons, magnetrons, traveling-wave, backward-wave tubes, etc.))

Sankar Moni Borah, Arup Ratan Pal, Heremba Bailung, Joyanti Chutia. Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma[J]. 中国物理B, 2011, 20(1): 14701-014701.

Sankar Moni Borah,Arup Ratan Pal,Heremba Bailung,andJoyanti Chutia . Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma[J]. Chin. Phys. B, 2011, 20(1): 14701-014701.

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Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma

Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma

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