中国物理B ›› 2010, Vol. 19 ›› Issue (1): 17201-017201.doi: 10.1088/1674-1056/19/1/017201

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Ab initio investigation of boron nanodevices: conductances of the different geometric conformations

李桂琴   

  1. Department of Physics, Tsinghua University, Beijing 100084, China
  • 收稿日期:2009-05-20 修回日期:2009-06-13 出版日期:2010-01-15 发布日期:2010-01-15

Ab initio investigation of boron nanodevices: conductances of the different geometric conformations

Li Gui-Qin(李桂琴)   

  1. Department of Physics, Tsinghua University, Beijing 100084, China
  • Received:2009-05-20 Revised:2009-06-13 Online:2010-01-15 Published:2010-01-15

摘要: Conductances of different geometric conformations of boron ribbon devices are calculated by the ab initio method. The I--V characteristics of three devices are rather different due to the difference in structure. The current of the hexagonal boron device is the largest and increases nonlinearly. The current of the hybrid hexagon-triangle boron device displays a large low-bias current and saturates at a value of about 5.2~μ A. The current of the flat triangular boron flake exhibits a voltage gap at low bias and rises sharply with increasing voltage. The flat triangular boron device can be either conducting or insulating, depending on the field.

Abstract: Conductances of different geometric conformations of boron ribbon devices are calculated by the ab initio method. The I--V characteristics of three devices are rather different due to the difference in structure. The current of the hexagonal boron device is the largest and increases nonlinearly. The current of the hybrid hexagon-triangle boron device displays a large low-bias current and saturates at a value of about 5.2 μA. The current of the flat triangular boron flake exhibits a voltage gap at low bias and rises sharply with increasing voltage. The flat triangular boron device can be either conducting or insulating, depending on the field.

Key words: boron, conductance, different geometry conformation

中图分类号:  (Electronic structure of nanoscale materials and related systems)

  • 73.22.-f
61.46.Fg (Nanotubes) 71.15.Ap (Basis sets (LCAO, plane-wave, APW, etc.) and related methodology (scattering methods, ASA, linearized methods, etc.)) 85.35.Kt (Nanotube devices)