中国物理B ›› 2010, Vol. 19 ›› Issue (1): 13101-013101.doi: 10.1088/1674-1056/19/1/013101

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First-principles study of diffusion behaviour of point defects in the O-terminated (0001) surface in wurtzite ZnO

黄贵洋1, 王崇愚1, 王建涛2   

  1. (1)Department of Physics, Tsinghua University, Beijing 100084, China; (2)Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
  • 收稿日期:2009-03-13 修回日期:2009-06-10 出版日期:2010-01-15 发布日期:2010-01-15
  • 基金资助:
    Project supported by ``973 Project'' of Ministry of Science and Technology of China (Grant No. 2006CB605102).

First-principles study of diffusion behaviour of point defects in the O-terminated (0001) surface in wurtzite ZnO

Huang Gui-Yang(黄贵洋)a)†, Wang Chong-Yu(王崇愚)a), and Wang Jian-Tao(王建涛)b)   

  1. a Department of Physics, Tsinghua University, Beijing 100084, China; b Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
  • Received:2009-03-13 Revised:2009-06-10 Online:2010-01-15 Published:2010-01-15
  • Supported by:
    Project supported by ``973 Project'' of Ministry of Science and Technology of China (Grant No. 2006CB605102).

摘要: A detailed first-principles study of the diffusion behaviour of point defects in the O-terminated (0001) surface in wurtzite ZnO was performed. The O vacancy and interstitial are found to diffuse much more easily in surface than in bulk. The Zn vacancy has a similar migration barrier for both bulk and surface, but has much smaller barrier for the diffuse-in process. The Zn interstitial is difficult to diffuse in the surface directly, but it can diffuse into the bulk relatively easily. Specific values of corresponding migration barriers are obtained.

Abstract: A detailed first-principles study of the diffusion behaviour of point defects in the O-terminated (0001) surface in wurtzite ZnO was performed. The O vacancy and interstitial are found to diffuse much more easily in surface than in bulk. The Zn vacancy has a similar migration barrier for both bulk and surface, but has much smaller barrier for the diffuse-in process. The Zn interstitial is difficult to diffuse in the surface directly, but it can diffuse into the bulk relatively easily. Specific values of corresponding migration barriers are obtained.

Key words: semiconductor, surface diffusion , first-principles calculation

中图分类号:  (Diffusion of other defects)

  • 66.30.Lw
61.72.J- (Point defects and defect clusters) 68.35.Dv (Composition, segregation; defects and impurities) 68.35.Fx (Diffusion; interface formation) 68.47.Fg (Semiconductor surfaces)