中国物理B ›› 2009, Vol. 18 ›› Issue (4): 1570-1573.doi: 10.1088/1674-1056/18/4/046
徐军1, 陆文琪1, 邓新绿1, 董闯1, 丁万昱2
Ding Wan-Yu(丁万昱)a)b)†, Xu Jun(徐军)a), Lu Wen-Qi(陆文琪)a), Deng Xin-Lu(邓新绿)a), and Dong Chuang(董闯)a)
摘要: This paper reports that amorphous silicon nitride (a-SiNx) overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNx overcoat has better anti-corrosion properties than that of reference a-CNx overcoats (2--4.5 nm). The superior anti-corrosion performance is attributed to its stoichiometric bond structure, where 94.8% Si atoms form Si--N asymmetric stretching vibration bonds. The N/Si ratio is 1.33 as in the stoichiometry of Si3N4 and corresponds to the highest hardness of 25.0 GPa. The surface is atomically smooth with RMS <0.2 nm. The ultra-thin a-SiNx overcoats are promising for hard disks and read/write heads protective coatings.
中图分类号: (Deposition by sputtering)