中国物理B ›› 2007, Vol. 16 ›› Issue (9): 2809-2813.doi: 10.1088/1009-1963/16/9/052

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Theoretical analysis of ion kinetic energies and DLC film deposition by CH4+Ar (He) dielectric barrier discharge plasmas

刘东平1, 刘艳红2, 张家良2, 马腾才2, 李建2   

  1. (1)Department of Mathematic and Physics, Dalian Nationality University, Dalian 116600, China; (2)State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China
  • 收稿日期:2006-06-05 修回日期:2007-03-09 出版日期:2007-09-20 发布日期:2007-09-20
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No 10405005).

Theoretical analysis of ion kinetic energies and DLC film deposition by CH4+Ar (He) dielectric barrier discharge plasmas

Liu Yan-Hong(刘艳红)a)†, Zhang Jia-Liang(张家良)a), Ma Teng-Cai(马腾才)a), Li Jian(李建)a), and Liu Dong-Ping(刘东平)b)   

  1. a State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China; b Department of Mathematic and Physics, Dalian Nationality University, Dalian 116600, China
  • Received:2006-06-05 Revised:2007-03-09 Online:2007-09-20 Published:2007-09-20
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No 10405005).

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摘要： The kinetic energy of ions in dielectric barrier discharge plasmas are analysed theoretically using the model of binary collisions between ions and gas molecules. Langevin equation for ions in other gases, Blanc law for ions in mixed gases, and the two-temperature model for ions at higher reduced field are used to determine the ion mobility. The kinetic energies of ions in CH$_{4}$\,+\,Ar(He) dielectric barrier discharge plasma at a fixed total gas pressure and various Ar (He) concentrations are calculated. It is found that with increasing Ar (He) concentration in CH$_{4}$\,+\,Ar (He) from 20{\%} to 83{\%}, the CH$_{4}^{ + }$ kinetic energy increases from 69.6 (43.9) to 92.1 (128.5)\,eV, while the Ar$^{ + }$ (He$^{ + })$ kinetic energy decreases from 97 (145.2) to 78.8 (75.5)\,eV. The increase of CH$_{4}^{ + }$ kinetic energy is responsible for the increase of hardness of diamond-like carbon films deposited by CH$_{4}$\,+\,Ar (He) dielectric barrier discharge without bias voltage over substrates.

关键词: ion energy, dielectric barrier discharge, diamond-like carbon deposition

Abstract: The kinetic energy of ions in dielectric barrier discharge plasmas are analysed theoretically using the model of binary collisions between ions and gas molecules. Langevin equation for ions in other gases, Blanc law for ions in mixed gases, and the two-temperature model for ions at higher reduced field are used to determine the ion mobility. The kinetic energies of ions in CH$_{4}$+Ar(He) dielectric barrier discharge plasma at a fixed total gas pressure and various Ar (He) concentrations are calculated. It is found that with increasing Ar (He) concentration in CH$_{4}$+Ar (He) from 20% to 83%, the CH$_{4}^{ + }$ kinetic energy increases from 69.6 (43.9) to 92.1 (128.5) eV, while the Ar$^{ + }$ (He$^{ + })$ kinetic energy decreases from 97 (145.2) to 78.8 (75.5) eV. The increase of CH$_{4}^{ + }$ kinetic energy is responsible for the increase of hardness of diamond-like carbon films deposited by CH$_{4}$+Ar (He) dielectric barrier discharge without bias voltage over substrates.

Key words: ion energy, dielectric barrier discharge, diamond-like carbon deposition

中图分类号:  (Methods of deposition of films and coatings; film growth and epitaxy)

  • 81.15.-z
52.77.Dq (Plasma-based ion implantation and deposition) 62.20.Qp (Friction, tribology, and hardness) 68.55.A- (Nucleation and growth) 68.60.Bs (Mechanical and acoustical properties) 81.40.Np (Fatigue, corrosion fatigue, embrittlement, cracking, fracture, and failure)