中国物理B ›› 2005, Vol. 14 ›› Issue (8): 1608-1612.doi: 10.1088/1009-1963/14/8/025

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Study of effect of H2 addition on the production of fluorocarbon radicals in H2C4F8 inductively coupled plasma via optical emission spectroscopy actinometry

黄松, 辛煜, 宁兆元   

  1. Department of Physics, Suzhou University, Suzhou 215006,China
  • 收稿日期:2004-09-16 修回日期:2004-11-23 出版日期:2005-07-13 发布日期:2005-07-13
  • 基金资助:
    Project supported by the Foundation of Key Laboratory of Thin Films, Jiangsu province, China, and the NationalNatural Science Foundation of China (Grant No 10305008).

Study of effect of H2 addition on the production of fluorocarbon radicals in H2C4F8 inductively coupled plasma via optical emission spectroscopy actinometry

Huang Song (黄松), Xin Yu (辛煜), Ning Zhao-Yuan (宁兆元)   

  1. Department of Physics, Suzhou University, Suzhou 215006,China
  • Received:2004-09-16 Revised:2004-11-23 Online:2005-07-13 Published:2005-07-13
  • Supported by:
    Project supported by the Foundation of Key Laboratory of Thin Films, Jiangsu province, China, and the NationalNatural Science Foundation of China (Grant No 10305008).

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摘要： C4F8 plasma with the addition of H2 is generated by the inductively coupled plasma (ICP) method. The relative densities of CF,CF2, H and F radicals are determined by actinometric optical emission spectroscopy (AOES) as a function of the gas flow rate ratio R=H2/(H2+C4F8 at a pressure of 0.8 Pa and an input r.f.power of 400W, while that of HF is measured by quadrupole mass spectrometry (QMS). The results show that plasma activity increases firstly and then decreases with increasing R. As the gas flow rate ratio R changes from 0 to 0.625, relative densities of both CF and CF2 decrease, and the relative [CF] has a similar tendency as the calculated [CF], indicating that CF radicals are generated mainly by the electron impact dissociation of CF2 radicals. Production of HF is also discussed.

关键词: optical emission spectroscopy, fluorocarbon radicals, C4F8 ICP plasma

Abstract: C4F8 plasma with the addition of H2 is generated by the inductively coupled plasma (ICP) method. The relative densities of CF,CF2, H and F radicals are determined by actinometric optical emission spectroscopy (AOES) as a function of the gas flow rate ratio R=H2/(H2+C4F8 at a pressure of 0.8 Pa and an input r.f.power of 400W, while that of HF is measured by quadrupole mass spectrometry (QMS). The results show that plasma activity increases firstly and then decreases with increasing R. As the gas flow rate ratio R changes from 0 to 0.625, relative densities of both CF and CF2 decrease, and the relative [CF] has a similar tendency as the calculated [CF], indicating that CF radicals are generated mainly by the electron impact dissociation of CF2 radicals. Production of HF is also discussed.

Key words: optical emission spectroscopy, fluorocarbon radicals, C4F8 ICP plasma

中图分类号:  (Emission, absorption, and scattering of electromagnetic radiation ?)

  • 52.25.Os
52.30.-q (Plasma dynamics and flow) 34.80.Ht (Dissociation and dissociative attachment) 82.33.Xj (Plasma reactions (including flowing afterglow and electric discharges)) 52.70.Kz (Optical (ultraviolet, visible, infrared) measurements) 52.80.Yr (Discharges for spectral sources)