中国物理B ›› 2005, Vol. 14 ›› Issue (4): 709-713.doi: 10.1088/1009-1963/14/4/012

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Theoretical analysis of cavity saturation spectroscopy of weak molecular absorbance

马维光, 董磊, 尹王保, 贾锁堂   

  1. College of Physics and Electronics Engineering, Shanxi University, State key Laboratory of Quantum Optics and Quantum Optics Devices, Taiyuan, 030006, China
  • 收稿日期:2004-03-15 修回日期:2004-11-23 出版日期:2005-04-20 发布日期:2005-03-28
  • 基金资助:
    Project supported by Special Grant for Key Programmes of Basic Research at its Earlier Stage, Ministry of Science and Technology, China (Grant No 2002ccc02500)

Theoretical analysis of cavity saturation spectroscopy of weak molecular absorbance

Ma Wei-Guang (马维光), Dong Lei (董磊), Yin Wang-Bao (尹王保), Jia Suo-Tang (贾锁堂)   

  1. College of Physics and Electronics Engineering, Shanxi University, State key Laboratory of Quantum Optics and Quantum Optics Devices, Taiyuan, 030006, China
  • Received:2004-03-15 Revised:2004-11-23 Online:2005-04-20 Published:2005-03-28
  • Supported by:
    Project supported by Special Grant for Key Programmes of Basic Research at its Earlier Stage, Ministry of Science and Technology, China (Grant No 2002ccc02500)

摘要: A theoretical analysis of sub-Doppler molecular saturation spectroscopy by use of a confocal Fabry--Perot (CFP) cavity is presented. The effects of gas pressure, cavity length and mirror reflectivity on the saturation dip amplitude are analysed. Such a treatment can provide the optimum conditions and a guidance for the experiment of saturating the weak molecular absorption lines.

Abstract: A theoretical analysis of sub-Doppler molecular saturation spectroscopy by use of a confocal Fabry--Perot (CFP) cavity is presented. The effects of gas pressure, cavity length and mirror reflectivity on the saturation dip amplitude are analysed. Such a treatment can provide the optimum conditions and a guidance for the experiment of saturating the weak molecular absorption lines.

Key words: CFP cavity, saturation dip, sub-Doppler spectroscopy

中图分类号:  (Molecular spectra)

  • 33.20.-t
33.70.Jg (Line and band widths, shapes, and shifts) 07.60.-j (Optical instruments and equipment)