中国物理B ›› 2003, Vol. 12 ›› Issue (12): 1414-1416.doi: 10.1088/1009-1963/12/12/013

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A simple method for boosting the beam quality of commercial DPL

张光寅, 焦志勇, 颜彩繁, 丁欣, 张潮波, 张晓华, 顾学文, 宋峰   

  1. Photonics Research Center, College of Physics Science, Nankai University, Tianjin 300071, China
  • 收稿日期:2003-05-19 修回日期:2003-06-23 出版日期:2003-12-16 发布日期:2005-03-16
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No 6007814) and the Foundation of the Key Laboratory of Strong Radiation of National 863 Project of China. The Number of Application of Patent is: 02238344.1.

A simple method for boosting the beam quality of commercial DPL

Zhang Guang-Yin (张光寅), Jiao Zhi-Yong (焦志勇), Yan Cai-Fan (颜彩繁), Ding Xin (丁欣), Zhang Chao-Bo (张潮波), Zhang Xiao-Hua (张晓华), Gu Xue-Wen (顾学文), Song Feng (宋峰)   

  1. Photonics Research Center, College of Physics Science, Nankai University, Tianjin 300071, China
  • Received:2003-05-19 Revised:2003-06-23 Online:2003-12-16 Published:2005-03-16
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No 6007814) and the Foundation of the Key Laboratory of Strong Radiation of National 863 Project of China. The Number of Application of Patent is: 02238344.1.

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摘要： A simple method for boosting the beam quality of a commercial laser diode pumped laser (DPL) is put forward. By keeping one of the mirrors unchanged and the moving the other mirror a proper distance away from the laser rod, high beam quality laser output is realized.

Abstract: A simple method for boosting the beam quality of a commercial laser diode pumped laser (DPL) is put forward. By keeping one of the mirrors unchanged and the moving the other mirror a proper distance away from the laser rod, high beam quality laser output is realized.

Key words: solid state laser, beam quality, $M^{2}$ factor

中图分类号:  (Doped-insulator lasers and other solid state lasers)

  • 42.55.Rz
42.79.Bh (Lenses, prisms and mirrors) 42.60.Da (Resonators, cavities, amplifiers, arrays, and rings) 42.60.Jf (Beam characteristics: profile, intensity, and power; spatial pattern formation)