Exploring negative ion behaviors and their influence on properties of DC magnetron sputtered ITO films under varied power and pressure conditions
Maoyang Li(李茂洋), Chaochao Mo(莫超超), Peiyu Ji(季佩宇), Xiaoman Zhang(张潇漫), Jiali Chen(陈佳丽), Lanjian Zhuge(诸葛兰剑), Xuemei Wu(吴雪梅), Haiyun Tan(谭海云), and Tianyuan Huang(黄天源)
Exploring negative ion behaviors and their influence on properties of DC magnetron sputtered ITO films under varied power and pressure conditions
Maoyang Li(李茂洋), Chaochao Mo(莫超超), Peiyu Ji(季佩宇), Xiaoman Zhang(张潇漫), Jiali Chen(陈佳丽), Lanjian Zhuge(诸葛兰剑), Xuemei Wu(吴雪梅), Haiyun Tan(谭海云), and Tianyuan Huang(黄天源)
中国物理B
.
2024, (10): 108102
-108102
.
DOI: 10.1088/1674-1056/ad62df