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Investigation of degradation and recovery characteristics of NBTI in 28-nm high-
k
metal gate process
Wei-Tai Gong(巩伟泰), Yan Li(李闫), Ya-Bin Sun(孙亚宾), Yan-Ling Shi(石艳玲), and Xiao-Jin Li(李小进)
Investigation of degradation and recovery characteristics of NBTI in 28-nm high-
k
metal gate process
Wei-Tai Gong(巩伟泰), Yan Li(李闫), Ya-Bin Sun(孙亚宾), Yan-Ling Shi(石艳玲), and Xiao-Jin Li(李小进)
中国物理B . 2023, (
12
): 128502 -128502 . DOI: 10.1088/1674-1056/ace034