Charge trapping effect at the interface of ferroelectric/interlayer in the ferroelectric field effect transistor gate stack
Xiaoqing Sun(孙晓清), Hao Xu(徐昊), Junshuai Chai(柴俊帅), Xiaolei Wang(王晓磊), and Wenwu Wang(王文武)
Charge trapping effect at the interface of ferroelectric/interlayer in the ferroelectric field effect transistor gate stack
Xiaoqing Sun(孙晓清), Hao Xu(徐昊), Junshuai Chai(柴俊帅), Xiaolei Wang(王晓磊), and Wenwu Wang(王文武)
中国物理B . 2023, (8): 87701 -087701 .  DOI: 10.1088/1674-1056/acd524