Improved electrical properties of NO-nitrided SiC/SiO
2 interface after electron irradiation
郝继龙, 白云, 刘新宇, 李诚瞻, 汤益丹, 陈宏, 田晓丽, 陆江, 王盛凯
Improved electrical properties of NO-nitrided SiC/SiO
2 interface after electron irradiation
Ji-Long Hao(郝继龙), Yun Bai(白云), Xin-Yu Liu(刘新宇), Cheng-Zhan Li(李诚瞻), Yi-Dan Tang(汤益丹), Hong Chen(陈宏), Xiao-Li Tian(田晓丽), Jiang Lu(陆江), Sheng-Kai Wang(王盛凯)
中国物理B
.
2020, (9): 97301
-097301
.
DOI: 10.1088/1674-1056/ab9434