Low-temperature plasma enhanced atomic layer deposition of large area HfS
2 nanocrystal thin films
常爱玲, 毛亦琛, 黄志伟, 洪海洋, 徐剑芳, 黄巍, 陈松岩, 李成
Low-temperature plasma enhanced atomic layer deposition of large area HfS
2 nanocrystal thin films
Ailing Chang(常爱玲), Yichen Mao(毛亦琛), Zhiwei Huang(黄志伟), Haiyang Hong(洪海洋), Jianfang Xu(徐剑芳), Wei Huang(黄巍), Songyan Chen(陈松岩), Cheng Li(李成)
中国物理B
.
2020, (3): 38102
-038102
.
DOI: 10.1088/1674-1056/ab6c4a