Analysis of the inhomogeneous barrier and phase composition of W/4H-SiC Schottky contacts formed at different annealing temperatures
董升旭, 白云, 汤益丹, 陈宏, 田晓丽, 杨成樾, 刘新宇
Analysis of the inhomogeneous barrier and phase composition of W/4H-SiC Schottky contacts formed at different annealing temperatures
Sheng-Xu Dong(董升旭), Yun Bai(白云), Yi-Dan Tang(汤益丹), Hong Chen(陈宏), Xiao-Li Tian(田晓丽), Cheng-Yue Yang(杨成樾), Xin-Yu Liu(刘新宇)
中国物理B
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2018, (9): 97305
-097305
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DOI: 10.1088/1674-1056/27/9/097305