Effect of microstructure on
3He migration in Ti
T
1.9 films
王海峰, 彭述明, 丁伟, 申华海, 王维笃, 周晓松, 龙兴贵
Effect of microstructure on
3He migration in Ti
T
1.9 films
Haifeng Wang(王海峰), Shuming Peng(彭述明), Wei Ding(丁伟), Huahai Shen(申华海), Weidu Wang(王维笃), Xiaosong Zhou(周晓松), Xinggui Long(龙兴贵)
中国物理B
.
2018, (9): 96103
-096103
.
DOI: 10.1088/1674-1056/27/9/096103