Interfacial and electrical characteristics of a HfO
2/n-InAlAs MOS-capacitor with different dielectric thicknesses
关赫, 吕红亮, 郭辉, 张义门, 张玉明, 武利翻
Interfacial and electrical characteristics of a HfO
2/n-InAlAs MOS-capacitor with different dielectric thicknesses
Guan He (关赫), Lv Hong-Liang (吕红亮), Guo Hui (郭辉), Zhang Yi-Men (张义门), Zhang Yu-Ming (张玉明), Wu Li-Fan (武利翻)
中国物理B
.
2015, (12): 126701
-126701
.
DOI: 10.1088/1674-1056/24/12/126701