Modeling the reactive sputter deposition of Ti-doped VO
x thin films
王涛, 于贺, 顾德恩, 郭睿, 董翔, 蒋亚东, 胡锐麟
Modeling the reactive sputter deposition of Ti-doped VO
x thin films
Wang Tao (王涛), Yu He (于贺), Gu De-En (顾德恩), Guo Rui (郭睿), Dong Xiang (董翔), Jiang Ya-Dong (蒋亚东), Hu Rui-Lin (胡锐麟)
中国物理B
.
2015, (6): 68104
-068104
.
DOI: 10.1088/1674-1056/24/6/068104