Modeling for V-O
2 reactive sputtering process using a pulsed power supply
王涛, 于贺, 董翔, 蒋亚东, 陈超, 胡锐麟
Modeling for V-O
2 reactive sputtering process using a pulsed power supply
Wang Tao (王涛), Yu He (于贺), Dong Xiang (董翔), Jiang Ya-Dong (蒋亚东), Chen Chao (陈超), Wu Ro-Land (胡锐麟)
Chin. Phys. B
.
2014, (8): 88113
-088113
.
DOI: 10.1088/1674-1056/23/8/088113
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