Degradation of ferroelectric and weak ferromagnetic properties of BiFeO
3 films due to the diffusion of silicon atoms
肖仁政, 张早娣, Vasiliy O. Pelenovich, 王泽松, 张瑞, 李慧, 刘雍, 黄志宏, 付德君
Degradation of ferroelectric and weak ferromagnetic properties of BiFeO
3 films due to the diffusion of silicon atoms
Xiao Ren-Zheng (肖仁政), Zhang Zao-Di (张早娣), Vasiliy O. Pelenovich, Wang Ze-Song (王泽松), Zhang Rui (张瑞), Li Hui (李慧), Liu Yong (刘雍), Huang Zhi-Hong (黄志宏), Fu De-Jun (付德君)
Chin. Phys. B
.
2014, (7): 77504
-077504
.
DOI: 10.1088/1674-1056/23/7/077504