Influence of annealing temperature on passivation performance of thermal atomic layer deposition Al <sub>2</sub>O <sub>3</sub> films

张祥, 刘邦武, 赵彦, 李超波, 夏洋

Influence of annealing temperature on passivation performance of thermal atomic layer deposition Al ₂O ₃ films

Zhang Xiang (张祥), Liu Bang-Wu (刘邦武), Zhao Yan (赵彦), Li Chao-Bo (李超波), Xia Yang (夏洋)

中国物理B . 2013, (12): 127303 -127303 . DOI: 10.1088/1674-1056/22/12/127303