A high performance HfSiON/TaN NMOSFET fabricated using a gate-last process
许高博, 徐秋霞, 殷华湘, 周华杰, 杨涛, 牛洁斌, 余嘉晗, 李俊峰, 赵超
A high performance HfSiON/TaN NMOSFET fabricated using a gate-last process
Xu Gao-Bo (许高博), Xu Qiu-Xia (徐秋霞), Yin Hua-Xiang (殷华湘), Zhou Hua-Jie (周华杰), Yang Tao (杨涛), Niu Jie-Bin (牛洁斌), Yu Jia-Han (余嘉晗), Li Jun-Feng (李俊峰), Zhao Chao (赵超)
中国物理B
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2013, (11): 117309
-117309
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DOI: 10.1088/1674-1056/22/11/117309