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The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH
4
/NH
3
/N
2
plasmas: Two-dimensional simulations
刘相梅, 宋远红, 姜巍, 易林
The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH
4
/NH
3
/N
2
plasmas: Two-dimensional simulations
Liu Xiang-Mei (刘相梅), Song Yuan-Hong (宋远红), Jiang Wei (姜巍), Yi Lin (易林)
Chin. Phys. B . 2013, (
4
): 45204 -045204 . DOI: 10.1088/1674-1056/22/4/045204