The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH 4/NH 3/N 2 plasmas: Two-dimensional simulations
刘相梅, 宋远红, 姜巍, 易林
The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH 4/NH 3/N 2 plasmas: Two-dimensional simulations
Liu Xiang-Mei (刘相梅), Song Yuan-Hong (宋远红), Jiang Wei (姜巍), Yi Lin (易林)
Chin. Phys. B . 2013, (4): 45204 -045204 .  DOI: 10.1088/1674-1056/22/4/045204