Optimum design of photoresist thickness for 90-nm critical dimension based on ArF laser lithography

陈德良, 曹益平, 黄振芬, 卢熙, 翟爱平

Chen De-Liang (陈德良), Cao Yi-Ping (曹益平), Huang Zhen-Fen (黄振芬), Lu Xi (卢熙), Zhai Ai-Ping (翟爱平 )

中国物理B . 2012, (8): 84201 -084201 . DOI: 10.1088/1674-1056/21/8/084201