Characteristics and properties of metal aluminum thin film prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology
熊玉卿, 李兴存, 陈强, 雷雯雯, 赵桥, 桑利军, 刘忠伟, 王正铎, 杨丽珍
Characteristics and properties of metal aluminum thin film prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology
Xiong Yu-Qing(熊玉卿), Li Xing-Cun(李兴存), Chen Qiang(陈强), Lei Wen-Wen(雷雯雯), Zhao Qiao(赵桥), Sang Li-Jun(桑利军), Liu Zhong-Wei(刘忠伟), Wang Zheng-Duo(王正铎), and Yang Li-Zhen(杨丽珍)
中国物理B
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2012, (7): 78105
-078105
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DOI: 10.1088/1674-1056/21/7/078105