Investigation of the inhibiting outdiffusion of erbium atoms to a silicon-on-insulator surface after annealing at high temperature
秦希峰, 李洪珍, 李双, 冀子武, 王绘凝, 王凤翔, 付刚
Investigation of the inhibiting outdiffusion of erbium atoms to a silicon-on-insulator surface after annealing at high temperature
Qin Xi-Feng(秦希峰), Li Hong-Zhen(李洪珍), Li Shuang(李双), Ji Zi-Wu(冀子武), Wang Hui-Ning(王绘凝), Wang Feng-Xiang(王凤翔), and Fu Gang(付刚)
中国物理B
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2012, (6): 66105
-066105
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DOI: 10.1088/1674-1056/21/6/066105