Improving lithographic masks with the assistance of indentations
郭英楠, 李旭峰, 潘石, 王乔, 王硕, 吴永宽
Improving lithographic masks with the assistance of indentations
Guo Ying-Nan(郭英楠), Li Xu-Feng(李旭峰), Pan Shi(潘石), Wang Qiao(王乔), Wang Shuo(王硕), and Wu Yong-Kuan(吴永宽)
中国物理B
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2012, (5): 57301
-057301
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DOI: 10.1088/1674-1056/21/5/057301