Flat-band voltage shift in metal-gate/high-
k/Si stacks
黄安平, 郑晓虎, 肖志松, 杨智超, 王玫, 朱剑豪, 杨晓东
Flat-band voltage shift in metal-gate/high-
k/Si stacks
Huang An-Ping(黄安平), Zheng Xiao-Hu(郑晓虎), Xiao Zhi-Song(肖志松), Yang Zhi-Chao(杨智超), Wang Mei(王玫), Paul K. Chu(朱剑豪), and Yang Xiao-Dong(杨晓东)
中国物理B
.
2011, (9): 97303
-097303
.
DOI: 10.1088/1674-1056/20/9/097303