Analysis of heating effect on the process of high deposition rate microcrystalline silicon
张晓丹, 张鹤, 魏长春, 孙建, 侯国付, 熊绍珍, 耿新华, 赵颖
Analysis of heating effect on the process of high deposition rate microcrystalline silicon
Zhang Xiao-Dan(张晓丹),Zhang He(张鹤),Wei Chang-Chun(魏长春), Sun Jian(孙建), Hou Guo-Fu(侯国付), Xiong Shao-Zhen(熊绍珍),Geng Xin-Hua(耿新华), and Zhao Ying(赵颖)
中国物理B
.
2010, (3): 38101
-038101
.
DOI: 10.1088/1674-1056/19/3/038101