Characteristics of high-quality HfSiON gate dielectric prepared by physical vapour deposition

许高博, 徐秋霞

Xu Gao-Bo(许高博) and Xu Qiu-Xia(徐秋霞)

中国物理B . 2009, (2): 768 -772 . DOI: 10.1088/1674-1056/18/2/059