Effects of deposition pressure and plasma power on the growth and properties of boron-doped microcrystalline silicon films
陈永生, 杨仕娥, 汪建华, 卢景霄, 郜小勇, 谷景华, 郑文, 赵尚丽
Effects of deposition pressure and plasma power on the growth and properties of boron-doped microcrystalline silicon films
Chen Yong-Sheng (陈永生), Yang Shi-E(杨仕娥), Wang Jian-Hua(汪建华), Lu Jing-Xiao(卢景霄), Gao Xiao-Yong(郜小勇), Gu Jin-Hua(谷景华), Zheng Wen(郑文), and Zhao Shang-Li(赵尚丽)
中国物理B
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2008, (4): 1394
-1399
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DOI: 10.1088/1674-1056/17/4/040