Improvement of electrical properties of Cu/SiCOH low-k film integrated system by O
2 plasma treatment
钱晓梅, 卫永霞, 俞笑竹, 叶超, 宁兆元, 梁荣庆
Improvement of electrical properties of Cu/SiCOH low-
k film integrated system by O
2 plasma treatment
Qian Xiao-Mei(钱晓梅), Wei Yong-Xia(卫永霞), Yu Xiao-Zhu(俞笑竹), Ye Chao(叶超), Ning Zhao-Yuan(宁兆元), and Liang Rong-Qing(梁荣庆)
中国物理B
.
2007, (2): 524
-528
.
DOI: 10.1088/1009-1963/16/2/039