Influence of total gas flow rate on microcrystalline silicon films prepared by VHF-PECVD
高艳涛, 张晓丹, 赵颖, 孙健, 朱峰, 魏长春, 陈飞
Influence of total gas flow rate on microcrystalline silicon films prepared by VHF-PECVD
Gao Yan-Tao (高艳涛), Zhang Xiao-Dan (张晓丹), Zhao Ying (赵颖), Sun Jian (孙健), Zhu Feng (朱峰), Wei Chang-Chun (魏长春), Chen Fei (陈飞)
中国物理B
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2006, (5): 1110
-1113
.
DOI: 10.1088/1009-1963/15/5/041