Annealing characteristics of ultra-thin high-K HfO 2 gate dielectrics
韩德栋, 康晋锋, 林长海, 韩汝琦
Annealing characteristics of ultra-thin high- K HfO 2 gate dielectrics
Han De-Dong (韩德栋), Kang Jin-Feng (康晋锋), Lin Chang-Hai (林长海), Han Ru-Qi (韩汝琦)
中国物理B . 2003, (3): 325 -327 .  DOI: 10.1088/1009-1963/12/3/314