BEHAVIOR OF Ar PLASMA FORMED IN A HIGH DENSITY PLASMA SOURCE-AN ECR REACTOR
吴汉明, D.B. GRAVES, R.K PORTEOUS, 李明
BEHAVIOR OF Ar PLASMA FORMED IN A HIGH DENSITY PLASMA SOURCE-AN ECR REACTOR
WU HAN-MING (吴汉明), D.B. GRAVES, R.K PORTEOUS, LI MING (李明)
中国物理B . 1994, (10): 746 -757 .  DOI: 10.1088/1004-423X/3/10/004