中国物理B ›› 2023, Vol. 32 ›› Issue (10): 100601-100601.doi: 10.1088/1674-1056/ace95b
Zhi-Jun Yin(尹志珺)1,2,3,4,5, Zhao-Hui Tang(唐朝辉)1,2,3,4,5, Wen Tan(谭文)1,2,3,4,5, Guang-Xu Xiao(肖光旭)1,2,3,4,5, Yu-Lin Yao(姚玉林)1,2,3,4,5, Dong-Bai Xue(薛栋柏)1,2,3,4,5, Zhen-Jie Gu(顾振杰)1,2,3,4,5, Li-Hua Lei(雷李华)6, Xiong Dun(顿雄)1,2,3,4,5, Xiao Deng(邓晓)1,2,3,4,5,†, Xin-Bin Cheng(程鑫彬)1,2,3,4,5, and Tong-Bao Li(李同保)1,2,3,4,5
Zhi-Jun Yin(尹志珺)1,2,3,4,5, Zhao-Hui Tang(唐朝辉)1,2,3,4,5, Wen Tan(谭文)1,2,3,4,5, Guang-Xu Xiao(肖光旭)1,2,3,4,5, Yu-Lin Yao(姚玉林)1,2,3,4,5, Dong-Bai Xue(薛栋柏)1,2,3,4,5, Zhen-Jie Gu(顾振杰)1,2,3,4,5, Li-Hua Lei(雷李华)6, Xiong Dun(顿雄)1,2,3,4,5, Xiao Deng(邓晓)1,2,3,4,5,†, Xin-Bin Cheng(程鑫彬)1,2,3,4,5, and Tong-Bao Li(李同保)1,2,3,4,5
摘要: Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy, uniformity, and consistency. However, the inherent difference between the interaction of positive and negative frequency detuning standing wave field and the atoms can cause a difference in the adjacent peak-to-valley heights of the grating in positive and negative frequency detuning chromium atom lithography, which greatly reduces its accuracy. In this study, we performed a controlled variable growth simulation using the semi-classical theoretical model and Monte Carlo method with trajectory tracking and ballistic deposition methods to investigate the influence of key experimental parameters on the surface growth process of positive and negative frequency detuning atomic lithography gratings. We established a theoretical model based on simulation results and summarized empirical equations to guide the selection of experimental parameters. Our simulations achieved uniform positive and negative frequency detuning atomic lithography gratings with a period of 1/4 of the wavelength corresponding to the atomic transition frequency, and adjacent peak-to-valley heights differing by no more than 2 nm, providing an important theoretical reference for the controllable fabrication of these gratings.
中图分类号: (Metrology)