中国物理B ›› 2002, Vol. 11 ›› Issue (5): 502-505.doi: 10.1088/1009-1963/11/5/317

• CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES • 上一篇    下一篇

Photoluminescence of amorphous carbon films fabricated by layer-by-layer hydrogen plasma chemical annealing method

徐骏, 黄晓辉, 李伟, 王立, 陈坤基   

  1. State Key Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
  • 收稿日期:2001-09-27 修回日期:2001-10-29 出版日期:2005-06-13 发布日期:2005-06-13
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No 59802004), and the Natural Science Foundation of Jiangsu Province, China (Grant No BK99047).

Photoluminescence of amorphous carbon films fabricated by layer-by-layer hydrogen plasma chemical annealing method

Xu Jun (徐骏), Huang Xiao-Hui (黄晓辉), Li Wei (李伟), Wang Li (王立), Chen Kun-Ji (陈坤基)   

  1. State Key Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, China
  • Received:2001-09-27 Revised:2001-10-29 Online:2005-06-13 Published:2005-06-13
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No 59802004), and the Natural Science Foundation of Jiangsu Province, China (Grant No BK99047).

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摘要： A method in which nanometre-thick film deposition was alternated with hydrogen plasma annealing (layer-by-layer method) was applied to fabricate hydrogenated amorphous carbon films in a conventional plasma-enhanced chemical vapour deposition system. It was found that the hydrogen plasma treatment could decrease the hydrogen concentration in the films and change the sp2/sp3 ratio to some extent by chemical etching. Blue photoluminescence was observed at room temperature, as a result of the reduction of sp2 clusters in the films.

Abstract: A method in which nanometre-thick film deposition was alternated with hydrogen plasma annealing (layer-by-layer method) was applied to fabricate hydrogenated amorphous carbon films in a conventional plasma-enhanced chemical vapour deposition system. It was found that the hydrogen plasma treatment could decrease the hydrogen concentration in the films and change the sp2/sp3 ratio to some extent by chemical etching. Blue photoluminescence was observed at room temperature, as a result of the reduction of sp2 clusters in the films.

Key words: hydrogen plasma annealing, amorphous carbon, photoluminescence

中图分类号:  (Amorphous materials; glasses and other disordered solids)

  • 78.55.Qr
81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)) 81.65.Cf (Surface cleaning, etching, patterning) 61.43.Er (Other amorphous solids)